| Nanoimprint Lithography: Principles, Processes and Materials (Nanotechnology Science and Technology) |  | Authors: Hongbo Lan, Yucheng Ding, Hongzhong Liu
Publisher: Nova Science Pub Inc
Category: Book
List Price: $47.00
Buy New: $46.82
as of 5/23/2012 11:13 CDT details
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New (14) Used (4) from $46.82
Seller: Smart Choice USA
Sales Rank: 3,404,697
Media: Paperback
Pages: 73
Number Of Items: 1
Shipping Weight (lbs): 0.2
Dimensions (in): 8.8 x 6 x 0.3
ISBN: 1611225019
Dewey Decimal Number: 621.381531
EAN: 9781611225013
ASIN: 1611225019
Publication Date: January 2011
Availability: Usually ships in 1-2 business days
Condition: This is a Brand New Book. Excellent customer service. Buy with confidence. May Ship from MO based on buyer proximity and availability.
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Product Description
Lithography, the fundamental fabrication process of semiconductor devices, has been playing a critical role in micro-nanofabrication technologies and manufacturing of Integrated Circuits (IC). Traditional optical lithography including contact and project photolithography has contributed significantly to the semiconductor device advancements. Currently, maintaining the rapid pace of half-pitch reduction requires overcoming the challenge of improving and extending the incumbent optical projection lithography technology while simultaneously developing alternative, next generation lithography (NGL) technologies to be used when optical projection lithography is no longer more economical than the alternatives. Furthermore, NIL is also one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures as this highly technical book will give new insight to.
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